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Home/ Products/ Thin-Film Capacitive Aluminum Nitride Ceramic Substrate
PRODUCT DETAILS
Base Material: Aluminum Nitride
Board Thickness: 0.4mm
Min. Line Width/Line Distance: 0.15±0.005mm/0.07±0.005mm
Surface Treatment: Front Side: Au≥1.0μm; Back Side: Au≥0.5μm;
Application: Capacitors
Process: Min. line width 30μm, accurate etching thick gold
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